NEC, Sony and Toshiba team to develop 45 nm process

Tokyo (Japan) - NEC, Sony and Toshiba agreed to collaborate on the development of a 45 nm process technology for semiconductors. The companies hope that the miniaturization will result in higher performance and functionality as well as lower power consumption of integrated circuits.

Sony and Toshiba originally announced their joint development of a 45 nm LSI (Large Scale Integration) process back in February of 2004 and since then have worked on the project at Toshiba's Advanced Microelectronics Center in Yokohama, Japan. So far, the results have not shown up in actual products, but have been discussed at industry conferences.

The two firms now agreed to include NEC's 45 nm team in their development work in Yokohama and hope that the additional knowledge will "accelerate" the development of the production technology.

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